Polymeric halocarbons as plasma etch barriers

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156646, 156655, 1566591, 156668, 204192E, 427 40, 427 431, 430296, B44C 122, C03C 1500, C03C 2506, B29C 1708

Patent

active

044526652

ABSTRACT:
A polymeric halocarbon is used as an etch barrier for plasma etching in a process to make high resolution, high aspect ratio polymer patterns.

REFERENCES:
patent: 4362598 (1982-12-01), Griffing
Polymer Engineering and Science, Mid-Nov., 1980, vol. 20, No. 16, Oxygen Plasma Removal of Thin Polymer Films, Taylor et al., pp. 1087-1092.

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