Polymeric dyes for antireflective coatings

Details Polymeric dyes for antireflective coatings Polymeric dyes for antireflective coatings

1995-06-06

1998-09-01

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430159, 430517, 5253274, 5253276, 427160, 4273855, G03F 711, B05D 302, B05D 138, G03C 1825

Patent

active

058009639

ABSTRACT:
A composition and methods for the use and manufacture thereof are provided for a polymeric dye. The composition comprises one or more aminoaromatic chromophores in conjunction with polymers having an anhydride group or the reaction products thereof. The composition is particularly useful as an underlaying antireflective coating with microlithographic photoresists for the absorbtion of near or deep ultraviolet radiation.

REFERENCES:
patent: 2751373 (1956-06-01), Unruh et al.
patent: 2811509 (1957-10-01), Smith et al.
patent: 3763086 (1973-10-01), Kalopissis et al.
patent: 3854946 (1974-12-01), Sayigh et al.
patent: 3945831 (1976-03-01), Satomura
patent: 4370405 (1983-01-01), O'Toole et al.
patent: 4575480 (1986-03-01), Kotani et al.
patent: 4609614 (1986-09-01), Pampalone et al.
patent: 4728724 (1988-03-01), Jones, Jr. et al.
patent: 4828960 (1989-05-01), Hertog
patent: 4882260 (1989-11-01), Kohara et al.
patent: 4910122 (1990-03-01), Arnold et al.
patent: 4943511 (1990-07-01), Lazarus et al.
patent: 4948697 (1990-08-01), Durham
patent: 4981915 (1991-01-01), MacLeay et al.
patent: 5043243 (1991-08-01), Yajima et al.
patent: 5074643 (1991-12-01), Petisce
patent: 5244994 (1993-09-01), Linehan
patent: 5294680 (1994-03-01), Knors et al.
patent: 5328803 (1994-07-01), Fujikura et al.
patent: 5362812 (1994-11-01), Holmes et al.
patent: 5401614 (1995-03-01), Dichiara et al.
patent: 5482817 (1996-01-01), Dichiara et al.
patent: 5516886 (1996-05-01), Rahman et al.
patent: 5580700 (1996-12-01), Rahman
D. Widman, et al., IEEE Trans. Electron Devices, ED-22, 467 (1975).
M. Bolsen, et al., Solid State Tech., Feb. 1986, 83.
T. Brunner, SPIE, 1466, 297 (1991).
T. Tanaka, et al., J. Electrochem Soc. 137, 3900, (1990).
T. Pampalone, et al. J. Electrochem Soc. 136, 1181, (1989).
W. M. Moreau, Semiconductor Lithography, Principles, Practices, and Materials, Prenum, NY, 1988, Chapters 2 and 10.
M. Horn, Solid State Tech., 58, Nov. 1991.

Affiliated with

Also associated with

Rating

Polymeric dyes for antireflective coatings does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polymeric dyes for antireflective coatings, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polymeric dyes for antireflective coatings will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-268623