Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-05-25
2008-08-05
Lee, Sin J. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S910000, C430S326000, C430S325000, C526S266000, C526S270000
Reexamination Certificate
active
07407733
ABSTRACT:
A polymeric compound of the invention includes at least one monomer unit represented by the following formula (I);wherein Rais a hydrogen atom, a halogen atom, an alkyl group of 1 to 6 carbon atoms or an haloalkyl group of 1 to 6 carbon atoms; each of R1and R2is identical to or different from a hydrogen atom or a hydrocarbon group, provided that at least one of R1and R2is a hydrocarbon group; R1and R2may be bonded together to form a ring with an adjacent carbon atom; and each of R3, R4, R5, R6, R7, R8and R9is identical to or different from a hydrogen atom or a hydrocarbon group. This polymeric compound has not only high substrate adhesion and high etching resistance but also high solubility for a resist solvent.
REFERENCES:
patent: 2003/0087183 (2003-05-01), Nishi et al.
patent: 2005/0014087 (2005-01-01), Nishimura et al.
patent: 2005/0089796 (2005-04-01), Funatsu et al.
patent: 2000-26446 (2000-01-01), None
patent: 2000-122294 (2000-04-01), None
patent: 2002-169289 (2002-06-01), None
patent: 2002-212174 (2002-07-01), None
patent: 2003-147023 (2003-05-01), None
patent: 2004-323704 (2004-11-01), None
patent: 2005-97533 (2005-04-01), None
Machine-assisted English translation of JP 2002-212174, provided by JPO.
Asada Takeshi
Koyama Hiroshi
Birch & Stewart Kolasch & Birch, LLP
Daicel Chemical Industries Ltd.
Lee Sin J.
LandOfFree
Polymeric compound containing a repeated unit having a... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Polymeric compound containing a repeated unit having a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polymeric compound containing a repeated unit having a... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3992998