Polymer with reduced internal migration

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156633, 156668, 20415761, 20415715, 427 541, 427322, B44C 122

Patent

active

049023780

ABSTRACT:
Semicrystalline polymers and copolymers having migratory additives therein can be provided with reduced migration. A surface layer of the polymer of copolymer article is rendered quasi-amorphous and a film less penetrable by said migratory additives than the polymer or copolymer is adhered thereto.

REFERENCES:
patent: 2876187 (1959-03-01), Wolinski
patent: 3081485 (1963-03-01), Steigerwald
patent: 3145242 (1964-08-01), Bryan
patent: 3607354 (1971-09-01), Krogh et al.
patent: 3914521 (1975-10-01), Beatty et al.
patent: 3978341 (1976-08-01), Hoell
patent: 4048428 (1977-09-01), Baird et al.
patent: 4247496 (1981-01-01), Kawakami et al.
patent: 4311759 (1982-01-01), Glennon
patent: 4414059 (1983-11-01), Blum et al.
patent: 4417948 (1983-11-01), Mayne-Banton et al.
patent: 4482204 (1984-11-01), Blyler et al.
patent: 4518654 (1985-05-01), Eichbauer et al.
patent: 4568632 (1986-02-01), Blum et al.
patent: 4631155 (1986-12-01), Caines
patent: 4645895 (1987-02-01), Boxman et al.
patent: 4710563 (1987-12-01), Oetting
patent: 4822451 (1989-04-01), Ouderkirk et al.
patent: 4824699 (1989-04-01), Woo et al.
Journal of American Chemical Society, 104, 6784-6785 (1982), Srinivasan & Leigh.
Bishop & Dyer, Applied Physics Letters, 47, 1229 (1985).
Srinivasan & Lazare, Polymer, 26, 1297 (1985) Conference Issue.
Srinivasan, Journal of the Vacuum Society, B1, 923 (1983).
Day and Wiles, Journal of Applied Polymer Science, 16, 175 (1972).
Blais, Day and Wiles, Journal of Applied Polymer Science, 17, 1895 (1973).
Mimura et al., Japanese Journal of Applied Physics, 17, 541 (1978).
Lazare and Srinivasan, Journal Physical Chemistry, 90, 2124 (1986).
Kawamura et al., Applied Physics Letters, 40, 374 (1982).
Polymer Interface and Adhesion, Souheng Wu, published by Marcel Dekker, Inc. New York and Basel, Chapter 5, p. 206.
Yorkgitis et al., "Polymeric Film with Reduced Surface Friction," U.S. Ser. No. 25,884, filed Mar. 16, 1987.
Ouderkirk et al., "A Process for the Surface Modification of Semicrystalline Polymers," U.S. Ser. No. 25,874, filed Mar. 16, 1987.
Shinbach et al., "Heat Sealing of Semicrystalline Polymers," U.S. Ser. No. 26,051, filed Mar. 16, 1987.
Warner et al., "Surface Modification of Semicrystalline Polymers," U.S. Ser. No. 25,881, filed Mar. 16, 1987.
Ouderkirk et al., "Surface Modification of Semicrystalline Polymers," U.S. Ser. No. 25,845, filed Mar. 16, 1987.
Incremona et al., "Improved Adhesive Bonding to Polymer Surfaces," U.S. Ser. No. 25,847, filed Mar. 16, 1987.

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