Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-07-10
2007-07-10
Schilling, Richard L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S907000, C430S910000, C526S245000, C526S246000
Reexamination Certificate
active
11051721
ABSTRACT:
A chemically amplified resist composition using an alternating copolymer of α-trifluoroacrylic acid with norbornene as a base polymer lends itself to ArF laser lithographic micropatterning and is improved in transparency, plasma etching resistance, and line edge roughness.
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Endo Masayuki
Harada Yuji
Hatakeyama Jun
Kawai Yoshio
Kishimura Shinji
Birch & Stewart Kolasch & Birch, LLP
Central Glass Co. Ltd.
Matsushita Electric - Industrial Co., Ltd.
Schilling Richard L.
Shin-Etsu Chemical Co. , Ltd.
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