Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2005-08-02
2005-08-02
McPherson, John A. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S312000, C430S314000, C430S966000, C264S632000, C264S643000, C438S042000, C438S043000, C604S264000, C604S272000
Reexamination Certificate
active
06924087
ABSTRACT:
A method for producing microneedles. The method including disposing a first layer of a radiation sensitive polymer on to a working surface and selectively irradiating the first layer such that the first layer has at least one irradiated region and at least one non-irradiated region. The method also including developing the first layer so as to selectively remove one of the at least one irradiated region and the at least one non-irradiated region such that, at least part of at least one remaining region at least partially defines a form of at least part of a microneedle structure. A microneedle structure including a plurality of microneedles at least partially formed from a radiation sensitive polymer.
REFERENCES:
patent: 3964482 (1976-06-01), Gerstel et al.
patent: 6093520 (2000-07-01), Vladimirsky et al.
patent: 6334856 (2002-01-01), Allen et al.
patent: 2002/0155737 (2002-10-01), Roy et al.
Altpeter Dominique Maria
Berenschot Erwin
Boom Garrit
de Boer Meint
Hefetz Meir
Chacko-Davis Daborah
Friedman Mark M.
McPherson John A.
Nano Pass Technologies Ltd.
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