Polymer for forming anti-reflective coating layer

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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C430S271100, C430S323000, C528S361000

Reexamination Certificate

active

07465531

ABSTRACT:
A polymer for forming an organic anti-reflective coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography process and a composition comprising the same are disclosed. The polymer for forming an organic anti-reflective coating layer has repeating units represented bywherein, R1is a substituted or non-substituted alky group of C1 to C5.

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