Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2006-03-02
2008-12-16
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S271100, C430S323000, C528S361000
Reexamination Certificate
active
07465531
ABSTRACT:
A polymer for forming an organic anti-reflective coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography process and a composition comprising the same are disclosed. The polymer for forming an organic anti-reflective coating layer has repeating units represented bywherein, R1is a substituted or non-substituted alky group of C1 to C5.
REFERENCES:
patent: 3284411 (1966-11-01), Martin et al.
patent: 6309790 (2001-10-01), Jung et al.
patent: 6368768 (2002-04-01), Jung et al.
patent: 6388039 (2002-05-01), Jung et al.
patent: 6489423 (2002-12-01), Jung et al.
patent: 6489432 (2002-12-01), Jung et al.
patent: 6538090 (2003-03-01), Jung et al.
patent: 6548613 (2003-04-01), Jung et al.
patent: 6653049 (2003-11-01), Pavelchek et al.
patent: 6849373 (2005-02-01), Pavelchek et al.
patent: 7282530 (2007-10-01), Kim et al.
patent: 7309561 (2007-12-01), Kim et al.
patent: 7368219 (2008-05-01), Kim et al.
Muggee, AN 1983:540484, entered STN: May 12, 1984, ACS on STN, one page, English abstract of “Polymerization and characterization of several ester-substituted epoxides” from Proc. IUPAC, I.U.P.A.C, Macromol. Symp. 28th (1982) Publisher: Int. Union Pure Appli.CHem, Oxford, UK.
Darzens reaction-Wikipedia, the free encylcopedia, four pages, printed out Feb. 20, 2008.
Sequin, Tetrahedron Letters, No. 21, 1979 pp. 1833-1836, 1979 (no month).
Kim Deog-Bae
Kim Jae-Hyun
Kim Sang-Jung
Dongjin Semichem Co., Ltd.
Hamilton Cynthia
Park & Associates IP Law LLC
LandOfFree
Polymer for forming anti-reflective coating layer does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Polymer for forming anti-reflective coating layer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polymer for forming anti-reflective coating layer will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4031859