Polymer for forming anti-reflective coating layer

Details Polymer for forming anti-reflective coating layer Polymer for forming anti-reflective coating layer

2008-05-06

2008-05-06

Kelly, Cynthia H. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S311000, C430S273100, C430S325000, C430S330000, C430S331000, C526S266000, C526S329000

Reexamination Certificate

active

11312788

ABSTRACT:
A polymer for forming an organic anti-reflective coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography process and a composition comprising the same are disclosed. The polymer for forming an organic anti-reflective coating layer has a repeating unit represented bywherein, R1is hydrogen or methyl group, and R2is a substituted or non-substituted alky group of C1 to C5. The composition for forming the organic anti-reflective coating layer includes the polymer having the repeating unit represented by above Formulas; a light absorber; and a solvent.

REFERENCES:
patent: 6110595 (2000-08-01), Suzuki et al.
patent: 2006/0134558 (2006-06-01), Kim et al.

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