Polymer for forming anti-reflective coating layer

Details Polymer for forming anti-reflective coating layer Polymer for forming anti-reflective coating layer

2007-12-18

2007-12-18

Neckel, Alexa D. (Department: 1753)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S311000, C430S273100, C430S325000, C430S330000, C430S331000, C438S636000, C526S266000, C526S329000

Reexamination Certificate

active

11366368

ABSTRACT:
A polymer for forming an organic anti-reflective coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography process and a composition comprising the same are disclosed. The polymer for forming an organic anti-reflective coating layer has repeating units represented bywherein, R is a substituted or non-substituted alky group of C1 to C5.

REFERENCES:
patent: 2006/0134558 (2006-06-01), Kim et al.
patent: 2006/0199107 (2006-09-01), Kim et al.
patent: 2006/0199108 (2006-09-01), Kim et al.

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