Polymer compound, positive resist composition and resist...

Details Polymer compound, positive resist composition and resist... Polymer compound, positive resist composition and resist...

2005-09-22

2010-12-14

Walke, Amanda C. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

Reexamination Certificate

active

07851127

ABSTRACT:
The present invention relates to a polymer compound comprising at least one constituent unit (a0) selected from the group consisting of constituent units represented by the following general formulas (A0-1), (A0-2), (A0-3) and (A0-4) [wherein R represents a hydrogen atom or a lower alkyl group], and a constituent unit (a1) derived from an (a-lower alkyl)acrylate ester having an acid dissociable dissolution inhibiting group.

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Machine translation of JP 2002-188351.
Machine translation of JP 2002-251012.
International Search Report from PCT/JP2005/017533 dated Dec. 20, 2005.

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