Polymer compound, positive resist composition and method of...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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Details

C430S326000, C430S910000, C430S921000, C430S925000, C526S328500

Reexamination Certificate

active

07745098

ABSTRACT:
A polymer compound having a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) that is derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group but is not classified as said structural unit (a0).[wherein, R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; A represents a divalent aliphatic cyclic group that may have a substituent; B represents a divalent hydrocarbon group that may have a substituent; r represents an integer of 0 or 1; and R1represents an acid dissociable, dissolution inhibiting group]

REFERENCES:
patent: 5945517 (1999-08-01), Nitta et al.
patent: 6180313 (2001-01-01), Yukawa et al.
patent: 7074543 (2006-07-01), Iwai et al.
patent: H09-208554 (1997-08-01), None
patent: H11-35551 (1999-02-01), None
patent: H11-35552 (1999-02-01), None
patent: H11-35573 (1999-02-01), None
patent: H11-322707 (1999-11-01), None
patent: 2003-233188 (2003-08-01), None
patent: 2003-241385 (2003-08-01), None
patent: 2008-58538 (2008-03-01), None
patent: WO 2004/074242 (2004-09-01), None
Machine-assisted English translation of JP2003-233188 (as provided by JPO).
English abstract for JP2008-58538 provided by JPO.

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