Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-01-20
2010-10-05
Walke, Amanda C. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000
Reexamination Certificate
active
07807328
ABSTRACT:
The present invention provide a polymer compound whereby the alkali solubility greatly changes before and after exposure in a chemically amplified positive resist, and a photoresist composition including the polymer compound and a resist pattern formation method which can form a fine pattern with high resolution. The photoresist composition and the resist pattern formation method use the polymer compound including at least one substituent group selected from an alcoholic hydroxyl group, a phenolic hydroxyl group, or a carboxyl group as an alkali soluble group (i), wherein the substituent group is protected by an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1):in-line-formulae description="In-line Formulae" end="lead"?—CH2—O—R (1)in-line-formulae description="In-line Formulae" end="tail"?(wherein R represents an organic group containing no more than 20 carbon atoms and at least one hydrophilic group).
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Hada Hideo
Matsumaru Syogo
Ogata Toshiyuki
Knobbe Martens Olson & Bear LLP
Tokyo Ohka Kogyo Co. Ltd.
Walke Amanda C.
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