Polymer, chemically amplified resist composition and...

Details Polymer, chemically amplified resist composition and... Polymer, chemically amplified resist composition and...

2005-04-12

2005-04-12

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000, C526S242000, C526S281000, C526S262000, C526S308000, C526S319000, C526S331000, C526S313000

Reexamination Certificate

active

06878501

ABSTRACT:
Polymers comprising recurring units of cycloolefin having fluorinated alkyl introduced therein are novel and have transparency and alkali solubility. Using the polymers, resist compositions featuring low absorption of F2excimer laser light are obtained.

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 5576143 (1996-11-01), Aoai et al.
patent: 5580695 (1996-12-01), Murata et al.
patent: 5843624 (1998-12-01), Houlihan et al.
patent: 5968712 (1999-10-01), Thackeray et al.
patent: 5968713 (1999-10-01), Nozoki et al.
patent: 5998099 (1999-12-01), Houlihan et al.
patent: 6013416 (2000-01-01), Nozoki et al.
patent: 6136501 (2000-10-01), Trefonas, III et al.
patent: 6468712 (2002-10-01), Fedynyshyn
patent: 6503686 (2003-01-01), Fryd et al.
patent: 20020146638 (2002-10-01), Ito et al.
patent: 20020197555 (2002-12-01), Rahman et al.
patent: 63-27829 (1988-02-01), None
patent: 2-27660 (1990-06-01), None
patent: 9-73173 (1997-03-01), None
patent: 9-230595 (1997-09-01), None
patent: 10-10739 (1998-01-01), None
patent: wo 9733198 (1997-12-01), None
J. Photopolymer Sci. and Technol., vol. 5, No. 3 (1992), pp. 439-445.
J. Electrochem. Soc.: Solid-state Sci. and Technol., vol. 130, No. 1, Jan. 1983, pp. 143-146.
SPIE, vol. 2724, pp. 365-377 (1996).
SPIE, vol. 3678, pp. 1209-1214 (1999).
English Abstract JP 5-232706 (corresponds to US 5580695).
English Abstract JP 5-249683.
English Abstract JP 5-158239 (corresponding to US 5,576,143).
English Abstract JP 5-249662 (corresponding to US 5,968,712).
English Abstract JP 5-257282.
English Abstract JP 5-289340 (Corresponding to US 5,580,695).

Affiliated with

Also associated with

Rating

Polymer, chemically amplified resist composition and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polymer, chemically amplified resist composition and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polymer, chemically amplified resist composition and... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3432641