Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1998-05-22
2000-11-07
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430197, 430317, 430325, 430330, G03F 736, G03F 7012
Patent
active
061434752
ABSTRACT:
A polyimide precursor having repeating units of the formula: ##STR1## wherein R.sup.1 is a tetravalent organic group; and R.sup.2 is a divalent diphenyl group, is excellent in image formation and particularly suitable for forming a pattern using an i-line stepper, and gives a photosensitive resin composition by imparting photosensitivity to the polyimide precursor, said photosensitive resin composition being suitable for forming surface protective films for semiconductor devices or interlaminar insulating films for multilayer wiring boards.
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Hagiwara Hideo
Kaji Makoto
Kikkawa Haruhiko
Kojima Mitsumasa
Kojima Yasunori
Chu John S.
Hitachi Chemical Co.
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