Polyhydric phenol compound and chemically amplified resist...

Details Polyhydric phenol compound and chemically amplified resist... Polyhydric phenol compound and chemically amplified resist...

2007-10-22

2009-02-24

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S910000, C560S114000, C560S116000

Reexamination Certificate

active

07494763

ABSTRACT:
The present invention provides a polyhydric phenol compound represented by the formula (I):wherein at least one selected from R1, R2, R3, R4, and R5is a group represented by the formula (II):wherein X1, X2, X3and X4each independently represent a hydrogen atom or a C1-C4 alkyl group, n represents an integer of 0 to 3, Z1represents a C1-C6 alkyl group or a C3-C12 cycloalkyl group, and ring Y represents an alicyclic hydrocarbon group,and the others are hydrogen atoms, and a chemically amplified resist composition containing the same.

REFERENCES:
patent: 5407779 (1995-04-01), Uetani et al.
patent: 5866724 (1999-02-01), Ichikawa et al.
patent: 6492085 (2002-12-01), Shimatani et al.
patent: 6551755 (2003-04-01), Hidesaka et al.
patent: 6869742 (2005-03-01), Mizuta et al.
patent: 2006-058739 (2006-03-01), None
Yamaguchi et al, “Characterization of Line-Edge Roughness in Resist Patterns and Estimation of its Effect on Device Performance,” Proceedings of SPIE, vol. 5038 (2003), pp. 689-694.

Affiliated with

Also associated with

Rating

Polyhydric phenol compound and chemically amplified resist... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polyhydric phenol compound and chemically amplified resist..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polyhydric phenol compound and chemically amplified resist... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4111700