Polycyclic resist compositions with increased etch resistance

Details Polycyclic resist compositions with increased etch resistance Polycyclic resist compositions with increased etch resistance

1999-02-19

2000-11-14

Wu, David W.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

526259, 526270, 526283, 526286, 526332, 526333, 526334, 526313, 526308, 526326, 526172, C08F13208

Patent

active

061471771

ABSTRACT:
Polycyclic polymers containing pendant aromatic moieties are disclosed. The polymers exhibit light transparency properties to deep UV wave lengths making them useful for high resolution photolithographic applications. These polymers are particularly useful in chemically amplified positive and negative tone resists.

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