Poly(silyl silane) homo and copolymers

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430297, 430311, 430312, 430323, G03C 500

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active

050395939

ABSTRACT:
Poly(silyl silanes) have been prepared. They have high photosensitivity and excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.

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