Polishing slurry composition and method of using the same

Details Polishing slurry composition and method of using the same Polishing slurry composition and method of using the same

2006-03-06

2009-10-13

Norton, Nadine (Department: 1792)

Compositions

Etching or brightening compositions

C252S079200, C252S079300, C252S079400, C438S692000, C438S693000, C216S088000, C216S089000

Reexamination Certificate

active

07601273

ABSTRACT:
A polishing slurry composition including an abrasive, a pH-adjusting agent, a water-soluble thickening agent, and a chelating agent, wherein the chelating agent includes at least one of an acetate chelating agent and a phosphate chelating agent, and a method of using the same.

REFERENCES:
patent: 3715842 (1973-02-01), Tredinnick et al.
patent: 4137303 (1979-01-01), Gaffar et al.
patent: 4169337 (1979-10-01), Payne
patent: 5352277 (1994-10-01), Sasaki
patent: 6189546 (2001-02-01), Zhang et al.
patent: 6855266 (2005-02-01), Wang et al.
patent: 7086935 (2006-08-01), Wang
patent: 2003/0136055 (2003-07-01), Li et al.
patent: 2005/0090104 (2005-04-01), Yang et al.
patent: 2005/0194358 (2005-09-01), Chelle
patent: 2006/0175295 (2006-08-01), Chu et al.

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