Abrading – Abrading process – Glass or stone abrading
Reexamination Certificate
2006-06-20
2006-06-20
Ackun, Jr., Jacob K. (Department: 3723)
Abrading
Abrading process
Glass or stone abrading
C451S057000
Reexamination Certificate
active
07063597
ABSTRACT:
Methods and compositions are provided for planarizing a substrate surface with reduced or minimal topographical defect formation during a polishing process for dielectric materials. In one aspect a method is provided for polishing a substrate containing two or more dielectric layers, such as silicon oxide, silicon nitride, silicon oxynitride, with at least one processing step using a fixed-abrasive polishing article as a polishing article. The processing steps may be used to remove all, substantially all, or a portion of the one or more dielectric layers, which may include removal of the topography, the bulk dielectric, or residual dielectric material of a dielectric layer in two or more steps.
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Lee Christopher Heung-Gyun
Leung Garlen C.
McReynolds Peter
Menk Gregory E.
Mohan Vasanth N.
Ackun Jr. Jacob K.
Applied Materials
Patterson and Sheridan
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