Polishing pad with transparent window having reduced window...

Details Polishing pad with transparent window having reduced window... Polishing pad with transparent window having reduced window...

2005-05-24

2005-05-24

Nguyen, George (Department: 3723)

Abrading

Precision device or process - or with condition responsive...

By optical sensor

C451S285000, C451S289000, C451S921000, C451S028000, C451S041000

Reexamination Certificate

active

06896585

ABSTRACT:
The polishing pad for a chemical mechanical polishing apparatus and method of making the same has a polishing pad with a bottom layer, a polishing surface on a top layer and a transparent sheet of material interposed between the two layers. Slurry from the chemical mechanical polishing process is prevented from penetrating the impermeable transparent sheet to the bottom layer of the polishing pad.

REFERENCES:
patent: 5081796 (1992-01-01), Schultz
patent: 5196353 (1993-03-01), Sandhu et al.
patent: 5257478 (1993-11-01), Hyde et al.
patent: 5265378 (1993-11-01), Rostoker
patent: 5413941 (1995-05-01), Koos et al.
patent: 5433651 (1995-07-01), Lustig et al.
patent: 5489233 (1996-02-01), Cook et al.
patent: 5605760 (1997-02-01), Roberts
patent: 5609511 (1997-03-01), Moriyama et al.
patent: 5672091 (1997-09-01), Takahashi et al.
patent: 5838447 (1998-11-01), Hiyama et al.
patent: 5872633 (1999-02-01), Holzapfel et al.
patent: 5893796 (1999-04-01), Birang et al.
patent: 5949927 (1999-09-01), Tang
patent: 5964643 (1999-10-01), Birang et al.
patent: 6045439 (2000-04-01), Birang et al.
patent: 6077783 (2000-06-01), Allman et al.
patent: 6102775 (2000-08-01), Ushio et al.
patent: 6146248 (2000-11-01), Jairath et al.
patent: 6171181 (2001-01-01), Roberts et al.
patent: 6190234 (2001-02-01), Swedek et al.
patent: 6213845 (2001-04-01), Elledge
patent: 6254459 (2001-07-01), Bajaj et al.
patent: 6280289 (2001-08-01), Wiswesser et al.
patent: 6280290 (2001-08-01), Birang et al.
patent: 6358130 (2002-03-01), Freeman et al.
patent: 6524164 (2003-02-01), Tolles
patent: 20010036805 (2001-11-01), Birang et al.
patent: 468 897 (1992-01-01), None
patent: 00663265 (1995-07-01), None
patent: 0738561 (1996-10-01), None
patent: 0881040 (1998-02-01), None
patent: 0881484 (1998-12-01), None
patent: 1075634 (1954-10-01), None
patent: 5-309558 (1978-01-01), None
patent: 58-4353 (1983-09-01), None
patent: 62-211927 (1987-09-01), None
patent: 2-222533 (1990-09-01), None
patent: 3-234467 (1991-10-01), None
patent: 06-039705 (1994-02-01), None
patent: 7-052032 (1995-02-01), None
patent: 08-264627 (1996-10-01), None
patent: 9-36072 (1997-01-01), None
patent: 10-034530 (1998-02-01), None
patent: 10-058309 (1998-03-01), None
patent: 10-094959 (1998-04-01), None
patent: 11-291162 (1999-10-01), None
patent: WO 9320976 (1993-10-01), None
patent: WO 9706921 (1997-02-01), None
patent: WO 0112387 (2001-02-01), None

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