Polishing pad window for a chemical-mechanical polishing tool

Details Polishing pad window for a chemical-mechanical polishing tool Polishing pad window for a chemical-mechanical polishing tool

2005-04-12

2005-04-12

Hail, III, Joseph J. (Department: 3723)

Abrading

Precision device or process - or with condition responsive...

By optical sensor

C451S287000, C451S288000

Reexamination Certificate

active

06878039

ABSTRACT:
A polishing pad assembly for use in a chemical-mechanical polishing apparatus comprises a polishing pad having at least a first aperture therethrough and a platen for supporting the polishing pad having a second aperture therethrough at least a portion of which is larger than the first aperture. A substantially transparent plug includes at least a first section having a first dimension for positioning substantially within the first aperture and at least a second section having a second dimension larger than the first dimension for positioning substantially within the second aperture. The optical plug is made of a polymeric material which may be press-fit through the platen into polishing pad.

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