Polishing pad, platen, method of monitoring, method of...

Details Polishing pad, platen, method of monitoring, method of... Polishing pad, platen, method of monitoring, method of...

2007-06-12

2007-06-12

Morgan, Eileen P. (Department: 3723)

Abrading

Precision device or process - or with condition responsive...

By optical sensor

C451S010000, C451S011000, C451S287000

Reexamination Certificate

active

10726637

ABSTRACT:
A polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting using a pseudo window area, where the pseudo window area has a thickness less than a thickness of a polishing layer and a thickness greater than zero.

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