Polishing method and electropolishing apparatus

Details Polishing method and electropolishing apparatus Polishing method and electropolishing apparatus

2007-08-14

2007-08-14

Wilkins, III, Harry D. (Department: 1742)

Electrolysis: processes, compositions used therein, and methods

Electrolytic erosion of a workpiece for shape or surface...

With control responsive to sensed condition

C205S647000

Reexamination Certificate

active

10694263

ABSTRACT:
A polishing method for electropolishing a metal film formed on a wafer surface so as to fill concave portions formed on the wafer surface comprises a step of determining an electropolishing end point of the metal film on the basis of a change of a current waveform resulting from electropolishing the metal film. An electropolishing apparatus comprising a current detector for detecting a current waveform resulting from electropolishing a metal film and an end point determination part for determining an electropolishing end point of the metal film on the basis of the change of a current detected with the current detector is used to realize the polishing method.

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patent: 2003/0062269 (2003-04-01), Sharan

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