Polishing composition and method utilizing abrasive...

Details Polishing composition and method utilizing abrasive... Polishing composition and method utilizing abrasive...

2011-08-09

2011-08-09

Deo, Duy-Vu N (Department: 1713)

Semiconductor device manufacturing: process

Chemical etching

Combined with the removal of material by nonchemical means

C438S691000, C438S692000, C438S693000, C051S307000, C051S308000

Reexamination Certificate

active

07994057

ABSTRACT:
The inventive method comprises chemically-mechanically polishing a substrate with an inventive polishing composition comprising a liquid carrier, a cationic polymer, an acid, and abrasive particles that have been treated with an aminosilane compound.

REFERENCES:
patent: 5174813 (1992-12-01), Cifuentes et al.
patent: 5196353 (1993-03-01), Sandhu et al.
patent: 5230833 (1993-07-01), Romberger et al.
patent: 5385975 (1995-01-01), Nakamura et al.
patent: 5428107 (1995-06-01), Tysak et al.
patent: 5433651 (1995-07-01), Lustig et al.
patent: 5489233 (1996-02-01), Cook et al.
patent: 5527423 (1996-06-01), Neville et al.
patent: 5609511 (1997-03-01), Moriyama et al.
patent: 5643046 (1997-07-01), Katakabe et al.
patent: 5645736 (1997-07-01), Allman
patent: 5658183 (1997-08-01), Sandhu et al.
patent: 5730642 (1998-03-01), Sandhu et al.
patent: 5767016 (1998-06-01), Muroyama
patent: 5770103 (1998-06-01), Wang et al.
patent: 5838447 (1998-11-01), Hiyama et al.
patent: 5872633 (1999-02-01), Holzapfel et al.
patent: 5893796 (1999-04-01), Birang et al.
patent: 5949927 (1999-09-01), Tang
patent: 5964643 (1999-10-01), Birang et al.
patent: 6062968 (2000-05-01), Sevilla et al.
patent: 6117000 (2000-09-01), Anjur et al.
patent: 6126532 (2000-10-01), Sevilla et al.
patent: 6136711 (2000-10-01), Grumbine et al.
patent: 6372648 (2002-04-01), Hall et al.
patent: 6390890 (2002-05-01), Molnar
patent: 6582623 (2003-06-01), Grumbine et al.
patent: 6646348 (2003-11-01), Grumbine et al.
patent: 6656241 (2003-12-01), Hellring et al.
patent: 6730245 (2004-05-01), Hampden-Smith et al.
patent: 6776810 (2004-08-01), Cherian et al.
patent: 6786945 (2004-09-01), Machii et al.
patent: 7038633 (2006-05-01), Eriksson
patent: 7044836 (2006-05-01), Sun et al.
patent: 7217989 (2007-05-01), Hiramitsu et al.
patent: 2005/0012658 (2005-01-01), Eriksson
patent: 2006/0084270 (2006-04-01), Hiramitsu et al.
patent: 2002294220 (2002-10-01), None
patent: 2006147993 (2006-06-01), None
patent: 539741 (2003-07-01), None
patent: WO 2005/075579 (2005-08-01), None

Affiliated with

Also associated with

Rating

Polishing composition and method utilizing abrasive... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polishing composition and method utilizing abrasive..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polishing composition and method utilizing abrasive... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2693103