Polishing cloth and method

Details Polishing cloth and method Polishing cloth and method

1988-05-13

1989-06-27

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156637, 156662, 156903, 156345, H01L 21306, B44C 122, C03C 1500, C23F 100

Patent

active

048426784

ABSTRACT:
The present invention relates to a polishing cloth comprising an expanded thermoplastic resin product having a cellular structure, and an expansion ratio of 1.5-fold to 30-fold, with substantially uniform cells having an average cell diameter of 300 .mu.m or less being distributed within the cross-section of the expanded product, and with unexpanded resin phases of 0.5 .mu.m to 45 .mu.m surrounded by three or more cells, wherein the proportion of the unexpanded phases are 0.01% to 70% in terms of area ratio within the expanded product cross-section, which has excellent performance of mirror surface polishing, for example, integrated circuit substrate, disc substrate for information recording, optical lens, optical mirror, etc. The present invention particularly relates to a polishing cloth for precise polishing to a surface roughness of 100 .ANG. or less.

REFERENCES:
patent: 4600469 (1986-07-01), Fusco et al.
patent: 4645561 (1987-02-01), Rea

Affiliated with

Also associated with

Rating

Polishing cloth and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polishing cloth and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polishing cloth and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-810988