Polishing apparatus

Details Polishing apparatus Polishing apparatus

1998-02-24

2000-02-01

Bueker, Richard

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

451287, 451288, 451 41, B24B 3700

Patent

active

060198680

ABSTRACT:
A polishing apparatus for polishing a workpiece to a flat mirror finish includes a turntable with a polishing cloth attached to an upper surface thereof, and a top ring for holding a workpiece thereon and pressing the workpiece against the polishing cloth to polish the workpiece. A retainer ring or a presser ring is disposed around the top ring. The retainer ring or the presser ring is vertically movable independently of the top ring, and pressed against the polishing cloth by a pressing mechanism. A stabilizing mechanism is disposed between an inner circumferential surface of the retainer ring or the presser ring, and an outer circumferential surface of the top ring, for holding the top ring substantially stabilized within the retainer ring or the presser ring.

REFERENCES:
patent: 5441444 (1995-08-01), Nakajima
patent: 5476414 (1995-12-01), Hirose et al.
patent: 5584751 (1996-12-01), Kobayashi et al.
patent: 5795215 (1998-08-01), Guthrie et al.
U.S. Patent Application No. 08/728,069, filed Oct. 9, 1996, entitled "Apparatus For And Method Of Polishing Workpiece", by Masamichi Nakashiba.
U.S. Patent Application No. 08/728,070, filed Oct. 9, 1996, entitled "Apparatus For And Method Of Polishing Workpiece", by Norio Kimura.

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