Platinum source compositions for chemical vapor deposition of pl

Details Platinum source compositions for chemical vapor deposition of pl Platinum source compositions for chemical vapor deposition of pl

1998-01-16

2000-12-19

Bowers, Charles

Semiconductor device manufacturing: process

Forming schottky junction

Using platinum group metal

438686, 427252, H01L 2144

Patent

active

061627127

ABSTRACT:
A platinum source reagent liquid solution, comprising:
(i) at least one platinum source compound selected from the group consisting of compounds of the formulae:

REFERENCES:
patent: 5104684 (1992-04-01), Tao et al.
patent: 5130172 (1992-07-01), Hicks et al.
patent: 5280012 (1994-01-01), Kirlin et al.
patent: 5403620 (1995-04-01), Kaesz et al.
patent: 5502227 (1996-03-01), Kanjolin
Goto, T. et al., "Prepartion of iridium and platinumfilms by MOCVD and thier properties" J. Phys. IV (1993), 3 (C3 Proceedings of the Ntth European concference on Chemical Vaoour Deposition, 1993), 297-304. ISSN: 1155-4339, 1993.
Koplitz, Lynn Vogel et al.; "Laser-Driven Chemical Vapor Deposition of Platinum at Atmospheric Pressure and Room Temperature from C.rho.Pt(CH.sub.3).sub.3," Appl. Phys. Lett. 53 (18), Oct. 31, 1988, pp. 1705-1707.
Chen, Yea-jer et al., "Low-Temperature Organometallic Chemical Vapor Deposition of Platinum," Appl. Phys. Lett. 53 (17), Oct. 24, 1988, pp. 1591-1592.
Xue, Ziling et al., "Organometallic Chemical Vapor Deposition of Platinum. Reaction Kinetics and Vapor Pressures of Precursors," Chem. Mater. 1992, 4, pp. 162-166.
Dryden, Neil H. et al., "Chemical Vapor Deposition of Platinum: New Precursors and Their Properties," Chem. Mater. 1991, 3, pp. 677-685.
Xue, Ziling et al., "Characterization of (Methylcyclopentadienyl)trimethylplatinum and Low-Temperature Organometallic Chemical Vapor Deposition of Platinum Metal," J. Am. Chem. Soc., 1989, III, 8779-8784.
Zin, Alfred A. et al., "Chemical Vapor Deposition of Platinum, Palladium and Nickel," chapter 7 of The Chemistry of Metal CVD, T. Kodas et al., editors, VCH Publishers, New York, 1994, pp. 329-355.
Rand, M.J., Electronchem. Soc., 1973, 120, p. 686.
Kumar, R., et al., Polyhedron, 1989, 8, p. 551.
Chiou, et al., "Application of the Polanyi Adsorption Potential Theory to Adsorption from Solution on Activated Carbon. IV. Steric Factors, as Illustrated by the Adsorption of Planar and Octahedral Metal Acetylacetonates," The Journal of Physical Chemistry. vol. 77 No. 6 (1973) pp. 809-813.
Lewis, et al., "Platinum(II) Bis(.beta.-diketonates) as Photoactivated Hydrosilation Catalysts," Inorganic Chemistry 1995, vol. 34, No. 12, pp. 3182-3189.
Xue, et al., "Characterization of (Methylcyclopentadienyl)trimethylplatinum and Low-Temperature Organometallic Chemical Vapor Deposition of Platinum Metal," J. Am. Chem. Soc. 1989 vol. 111, No. 24, pp. 8779-8784.
Nakabayashi, M., "Platinum Thin Film Formation, Semiconductor Device with it, and its Manufacture," abstract No. 26605s, Chem. Abstr., vol. 127, No. 2, Jul. 14, 1997 (Columbus, OH, USA) pp. 1286-1287.

Affiliated with

Also associated with

Rating

Platinum source compositions for chemical vapor deposition of pl does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Platinum source compositions for chemical vapor deposition of pl, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Platinum source compositions for chemical vapor deposition of pl will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-270811