Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Coating selected area
Patent
1998-07-22
2000-03-21
Gorgos, Kathryn
Electrolysis: processes, compositions used therein, and methods
Electrolytic coating
Coating selected area
205 96, 205157, 204DIG7, C25D 502
Patent
active
060398582
ABSTRACT:
A method and apparatus are provided for the electroplating on only one side of a substrate immersed in an electroplating bath comprising using a specially designed device which holds the substrate to be plated in spaced relation to an inhibitor electrode which is part of the device. To fabricate x-ray masks, a boron doped silicon substrate is secured to a dielectric clamp which clamp has a through opening which is positioned to overlie the inhibitor electrode. A cathode structure overlies the clamp and the cathode structure, substrate and clamp are secured to the device by preferably a pivotable, locking mechanism. A space is formed between the back side of the substrate and the surface of the inhibitor electrode so that plating is preferentially on the surface of the inhibitor electrode. The use of the method and apparatus minimizes plating on the backside of the substrate and provides a plated substrate on only the upper side of the substrate. The apparatus for holding the substrate comprises a plate member to which the inhibitor electrode is secured. The clamp holding the substrate is positioned overlying the inhibitor electrode and a cathode structure is secured against the plate member of the device and the assembled device is inserted in the electroplating bath for plating.
REFERENCES:
patent: 2675348 (1954-04-01), Greenspan
patent: 3350287 (1967-10-01), Bedi
patent: 3437578 (1969-04-01), Gibbs et al.
patent: 3634047 (1972-01-01), Faulkner
patent: 3901771 (1975-08-01), Froman et al.
patent: 5322614 (1994-06-01), May et al.
patent: 5466358 (1995-11-01), Kiyomiya et al.
patent: 5660699 (1997-08-01), Saito et al.
Ackel Robin J.
Benoit Douglas E.
Charland Michael H.
Faure Thomas B.
Gorgos Kathryn
International Business Machines - Corporation
Nicolas Wesley A.
Tomaszewski John J.
Walter, Jr. Howard J.
LandOfFree
Plating process for x-ray mask fabrication does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plating process for x-ray mask fabrication, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plating process for x-ray mask fabrication will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-727535