Platen exhaust for chemical mechanical polishing system

Details Platen exhaust for chemical mechanical polishing system Platen exhaust for chemical mechanical polishing system

2011-08-02

2011-08-02

Rose, Robert (Department: 3727)

Abrading

Abrading process

Glass or stone abrading

C451S288000

Reexamination Certificate

active

07988535

ABSTRACT:
The present invention generally relates to a substrate transferring system. Particularly, the present invention relates to apparatus and method to effectively remove the chemical fume, vapor and other byproducts generated during a polishing process. One embodiment of the present invention provides an apparatus for polishing a substrate comprising a platen having a polishing surface configured to polish the substrate by contacting the substrate while moving relatively to the substrate, a polishing head configured to support the substrate and position the substrate to be in contact with the polishing surface during polishing, a solution nozzle configured to dispense a polishing solution on the polishing surface, and an exhaust assembly configured to remove fume, vapor and other byproducts generated during polishing.

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patent: 7883394 (2011-02-01), Togawa et al.
patent: 2007/0270081 (2007-11-01), Crocco et al.

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