Plate making processing for using negative working light-sensiti

Details Plate making processing for using negative working light-sensiti Plate making processing for using negative working light-sensiti

1985-03-14

1987-02-10

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

430145, 430147, 430180, 430182, 430191, 430300, G03F 708

Patent

active

046422838

ABSTRACT:
A negative working light-sensitive lithographic plate requiring no dampening solution and a plate making process are described, the negative working light-sensitive lithographic plate comprising a support having, in sequence, on said support, (A) a light-sensitive layer containing (1) an o-quinonediazide compound and (2) a coupling component which causes a diazo coupling reaction under a basic environment, and (B) a silicone rubber layer, and the plate making process comprising imagewise exposing the negative working light-sensitive lithographic plate and developing said exposed plate to obtain a lithographic plate requiring no dampening solution, wherein a step of processing with base is carried out after imagewise exposure.

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patent: 4108664 (1978-08-01), de Boer et al.
patent: 4496647 (1985-01-01), Kawabe et al.

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