Plate for waterless lithographic

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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Details

4302731, 430303, 430302, G03F 711, G03F 730

Patent

active

061069973

DESCRIPTION:

BRIEF SUMMARY
TECHNICAL FIELD

The present invention relates to non-processed plates for waterless lithographic printing plates, and more precisely, to those for waterless lithographic printing plates with good printing durability, image reproducibility and storage stability.


BACKGROUND ART

Known are waterless lithographic printing plates having an ink-repellent layer of silicone rubber or fluorine resin, for which various types of photosensitive plates have heretofore been proposed to be processed through selective exposure and development.
Waterless lithography is a type of lithographic printing method requiring no water for wetting printing plates in operation, in which, in the printing plate to be used, the image area of an ink-receiving layer and the non-image area of an ink-repellent layer are basically in nearly the same flat surface of the plate. In such waterless lithography, ink is adhered only to the image area of the printing plate owing to the difference in the ink affinity between those two layers, and the thus-adhered ink is then transferred onto printing substances such as paper. The non-image area is of an ink-repellent material such as fluorine resin, and no water is used in printing.
For example, for non-processed plates for waterless, positive lithographic printing plates, proposed were those comprising a photo-polymerizable photosensitive layer and an ink-repellent layer of silicone rubber as laminated on a support, for example, in JP-B Sho-54-26923 and Sho-56-23150; and those comprising a photo-dimerizable photosensitive layer and an ink-repellent layer of silicone rubber as laminated on a support, for example, in JP-B Hei-3-56622 and JP-A Sho-61-153655. For non-processed plates for waterless, negative lithographic printing plates, proposed were those comprising a photo-peelable photosensitive layer of a polyfunctional isocyanate-crosslinked, partial ester of phenol-formaldehyde novolak resin with 1,2-naphthoquinone-2-diazido-5-sulfonic acid chloride, and an ink-repellent layer of silicone rubber as laminated on a support in that order, for example, in JP-B Sho-61-54222.
Those non-processed plates are generally exposed to active rays through positive or negative film, and then developed, whereby only the ink-repellent layer corresponding to the image area is removed and the photosensitive layer and, as the case may be, the underlying primer layer or support are exposed out to be the ink-receiving image area.
For non-processed photosensitive plates for waterless lithographic printing plates having an ink-repellent layer of fluorine resin, disclosed are those having an ink-repellent layer of fluorine resin with 1H,1H,2H,2H-heptadecafluorodecyl methacrylate, for example, in JP-A Hei-2-254449 and Hei-2-85855.
Various photo-reactive compounds have heretofore been proposed to be usable in the photosensitive layers for non-processed plates for waterless, positive lithographic printing plates of the known ones noted hereinabove. For example, JP-B Sho-54-26923 and JP-A Hei-5-281717 disclose methods of using specific amino group-having monomers for producing non-processed plates for high-sensitivity waterless lithographic printing plates, but the disclosed methods are problematic in that the non-processed plates produced therein are often adversely affected by the basic amino groups and their image reproducibility is worsened while they are stored for a long period of time.
JP-A Hei-1-237663 and Hei-2-237663 disclose methods of using polymers having ethylenic unsaturated groups in their side chains, which, however, are problematic in that the non-processed plates produced therein do not have good image reproducibility since the polymerization efficiency of the ethylenic unsaturated groups in the polymers used is much lower as compared with that in monomers, and that the adhesiveness between the photosensitive layer and the overlying ink-repellent layer in the plates is poor. In order to solve these problems, they proposed a combination of amino-free, hydroxyl-having monomers and the polymers, which, howev

REFERENCES:
patent: 5464686 (1995-11-01), Higashi et al.
patent: 5571658 (1996-11-01), Sonokawa et al.
Abe et al, Derwent-Acc No. 1993-046625, English Abstract of DE 4224938 A1, published Feb. 4, 1993, 2 pages.

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