Plasma wake field XUV radiation source

Details Plasma wake field XUV radiation source Plasma wake field XUV radiation source

1995-06-09

1997-06-10

Lee, Benny

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

250504R, 372 5, 372 55, H05H 124

Patent

active

056379625

ABSTRACT:
A XUV radiation source uses an interaction of electron beam pulses with a gas to create a plasma radiator. A flowing gas system (10) defines a circulation loop (12) with a device (14), such as a high pressure pump or the like, for circulating the gas. A nozzle or jet (16) produces a sonic atmospheric pressure flow and increases the density of the gas for interacting with an electron beam. An electron beam is formed by a conventional radio frequency (rf) accelerator (26) and electron pulses are conventionally formed by a beam buncher (28). The rf energy is thus converted to electron beam energy, the beam energy is used to create and then thermalize an atmospheric density flowing gas to a fully ionized plasma by interaction of beam pulses with the plasma wake field, and the energetic plasma then loses energy by line radiation at XUV wavelengths Collection and focusing optics (18) are used to collect XUV radiation emitted as line radiation when the high energy density plasma loses energy that was transferred from the electron beam pulses to the plasma.

REFERENCES:
patent: 4344174 (1982-08-01), Spalding et al.
patent: 4715038 (1987-12-01), Fraser et al.
patent: 4980563 (1990-12-01), George et al.
patent: 5185552 (1993-02-01), Suzuki et al.
Huber, Jr. et al., "Sustainer Enhancement of the VUV Fluorescence in Highessure Xeneon," IEEE Journal of Quantum Electronics, vol. QE-12, No. 6, Jun. 1976.
Werner et al., "Radiative and Kinetic Mechanisms in Bound-Free Excimer Lasers," IEEE Journal of Quantum Electronics, vol. QE-13, No. 9, Sep. 1977 .

Affiliated with

Also associated with

Rating

Plasma wake field XUV radiation source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma wake field XUV radiation source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma wake field XUV radiation source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-767588