Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2005-07-01
2011-12-13
Zervigon, Rudy (Department: 1716)
Coating apparatus
Gas or vapor deposition
With treating means
C156S345330, C156S345340
Reexamination Certificate
active
08074599
ABSTRACT:
Embodiments of a gas distribution plate for distributing gas in a processing chamber are provided. In one embodiment, a gas distribution assembly for a plasma processing chamber comprises a diffuser plate with gas passages passing between its upstream and downstream sides and hollow cathode cavities at the downstream side of the gas passages. The downstream side of the diffuser plate has a curvature to improve the thickness uniformity and film property uniformity of thin films deposited by PECVD, particularly SiN and amorphous silicon films. The curvature is preferably described by an arc of a circle or ellipse, the apex thereof located at the center point of the diffuser plate. In one aspect, the hollow cathode cavity volume density, surface area density, or the cavity density of the diffuser increases from the center of the diffuser to the outer edge. Methods for manufacturing such a diffuser plate are also provided.
REFERENCES:
patent: 3830194 (1974-08-01), Benzing et al.
patent: 3854443 (1974-12-01), Baerg
patent: 4474358 (1984-10-01), Bennett
patent: 4491520 (1985-01-01), Jaye et al.
patent: 4522149 (1985-06-01), Garbis et al.
patent: 4563367 (1986-01-01), Sherman
patent: 4726924 (1988-02-01), Mittelstadt
patent: 4763690 (1988-08-01), Martin
patent: 4792378 (1988-12-01), Rose et al.
patent: 4799418 (1989-01-01), Takahashi et al.
patent: 4809421 (1989-03-01), Justice
patent: 4854263 (1989-08-01), Chang et al.
patent: 4927991 (1990-05-01), Wendt et al.
patent: 4993358 (1991-02-01), Mahawili
patent: 5000113 (1991-03-01), Wang et al.
patent: 5044943 (1991-09-01), Bowman et al.
patent: 5124635 (1992-06-01), Henley et al.
patent: 5152504 (1992-10-01), Nixon et al.
patent: 5173580 (1992-12-01), Levin et al.
patent: 5268034 (1993-12-01), Vukelic
patent: 5332443 (1994-07-01), Chew et al.
patent: 5339387 (1994-08-01), Frankel
patent: 5399387 (1995-03-01), Law et al.
patent: 5421893 (1995-06-01), Perlov
patent: 5439524 (1995-08-01), Cain et al.
patent: 5500256 (1996-03-01), Watabe
patent: 5503809 (1996-04-01), Coate et al.
patent: 5567243 (1996-10-01), Foster et al.
patent: 5582866 (1996-12-01), White
patent: 5611865 (1997-03-01), White et al.
patent: 5614026 (1997-03-01), Williams
patent: 5614055 (1997-03-01), Fairbairn et al.
patent: 5628829 (1997-05-01), Foster et al.
patent: 5628869 (1997-05-01), Mallon
patent: 5647911 (1997-07-01), Vanell et al.
patent: 5714408 (1998-02-01), Ichikawa et al.
patent: 5766364 (1998-06-01), Ishida et al.
patent: 5819434 (1998-10-01), Herchen et al.
patent: 5820686 (1998-10-01), Moore
patent: 5844205 (1998-12-01), White et al.
patent: 5846332 (1998-12-01), Zhao et al.
patent: 5876838 (1999-03-01), Mallon
patent: 5882411 (1999-03-01), Zhao et al.
patent: 5928732 (1999-07-01), Law et al.
patent: 5950925 (1999-09-01), Fukunaga et al.
patent: 5968276 (1999-10-01), Lei et al.
patent: 5990016 (1999-11-01), Kim et al.
patent: 5994678 (1999-11-01), Zhao et al.
patent: 5997649 (1999-12-01), Hillman
patent: 6024799 (2000-02-01), Chen et al.
patent: 6030508 (2000-02-01), Yang et al.
patent: 6040022 (2000-03-01), Chang et al.
patent: 6041733 (2000-03-01), Kim et al.
patent: 6050506 (2000-04-01), Guo et al.
patent: 6079356 (2000-06-01), Umotoy et al.
patent: 6113700 (2000-09-01), Choi
patent: 6123775 (2000-09-01), Hao et al.
patent: 6140255 (2000-10-01), Ngo et al.
patent: 6148765 (2000-11-01), Lilleland et al.
patent: 6149365 (2000-11-01), White et al.
patent: 6150283 (2000-11-01), Ishiguro et al.
patent: 6167834 (2001-01-01), Wang et al.
patent: 6170432 (2001-01-01), Szapucki et al.
patent: 6176668 (2001-01-01), Kurita et al.
patent: 6182602 (2001-02-01), Redeker et al.
patent: 6182603 (2001-02-01), Shang et al.
patent: 6197151 (2001-03-01), Kaji et al.
patent: 6203622 (2001-03-01), Halpin et al.
patent: 6228438 (2001-05-01), Schmitt
patent: 6232218 (2001-05-01), Cathey et al.
patent: 6254742 (2001-07-01), Hanson et al.
patent: 6281469 (2001-08-01), Perrin et al.
patent: 6302057 (2001-10-01), Leusink et al.
patent: 6338874 (2002-01-01), Law et al.
patent: 6344420 (2002-02-01), Miyajima et al.
patent: 6364949 (2002-04-01), Or et al.
patent: 6371712 (2002-04-01), White et al.
patent: 6383573 (2002-05-01), Beck et al.
patent: 6444040 (2002-09-01), Herchen et al.
patent: 6454855 (2002-09-01), Von Kanel et al.
patent: 6477980 (2002-11-01), White et al.
patent: 6502530 (2003-01-01), Turlot et al.
patent: 6527908 (2003-03-01), Kanetsuki et al.
patent: 6548112 (2003-04-01), Hillman et al.
patent: 6548122 (2003-04-01), Sharma et al.
patent: 6556536 (2003-04-01), Reynolds et al.
patent: 6566186 (2003-05-01), Allman et al.
patent: 6593548 (2003-07-01), Matsumura et al.
patent: 6596576 (2003-07-01), Fu et al.
patent: 6599367 (2003-07-01), Nakatsuka
patent: 6616766 (2003-09-01), Dunham
patent: 6619131 (2003-09-01), Walchli et al.
patent: 6626988 (2003-09-01), Schmalstieg et al.
patent: 6626998 (2003-09-01), Dunham
patent: 6631692 (2003-10-01), Matsuki et al.
patent: 6663025 (2003-12-01), Halsey et al.
patent: 6664202 (2003-12-01), Tang et al.
patent: 6682630 (2004-01-01), Colpo et al.
patent: 6683216 (2004-01-01), Zoeller et al.
patent: 6740367 (2004-05-01), Matsuki et al.
patent: 6756324 (2004-06-01), Gates
patent: 6772827 (2004-08-01), Keller et al.
patent: 6793733 (2004-09-01), Janakiraman et al.
patent: 6814838 (2004-11-01), Weichart
patent: 6821347 (2004-11-01), Carpenter et al.
patent: 6852168 (2005-02-01), Park
patent: 6860965 (2005-03-01), Stevens
patent: 6873764 (2005-03-01), Maisenholder et al.
patent: 6881684 (2005-04-01), Aota et al.
patent: 6916407 (2005-07-01), Voser et al.
patent: 6918352 (2005-07-01), Von Kanel et al.
patent: 6924241 (2005-08-01), Lee
patent: 6942753 (2005-09-01), Choi et al.
patent: 6961490 (2005-11-01), Maisenholder et al.
patent: 7125758 (2006-10-01), Choi et al.
patent: 2001/0021422 (2001-09-01), Yamakoshi et al.
patent: 2001/0023742 (2001-09-01), Schmitt
patent: 2001/0029892 (2001-10-01), Cook et al.
patent: 2002/0006478 (2002-01-01), Yuda et al.
patent: 2002/0011215 (2002-01-01), Tei et al.
patent: 2002/0129769 (2002-09-01), Kim et al.
patent: 2002/0134309 (2002-09-01), Tu et al.
patent: 2002/0146879 (2002-10-01), Fu et al.
patent: 2002/0174950 (2002-11-01), Park
patent: 2002/0189545 (2002-12-01), Matsumura et al.
patent: 2003/0089314 (2003-05-01), Matsuki et al.
patent: 2003/0143410 (2003-07-01), Won et al.
patent: 2003/0170388 (2003-09-01), Shinriki et al.
patent: 2003/0199175 (2003-10-01), Tang et al.
patent: 2003/0209323 (2003-11-01), Yokogaki
patent: 2004/0003777 (2004-01-01), Carpenter et al.
patent: 2004/0043637 (2004-03-01), Aota et al.
patent: 2004/0064407 (2004-04-01), Kight et al.
patent: 2004/0129211 (2004-07-01), Blonigan et al.
patent: 2004/0145383 (2004-07-01), Brunner
patent: 2004/0228141 (2004-11-01), Hay et al.
patent: 2004/0250955 (2004-12-01), Blonigan et al.
patent: 2005/0000430 (2005-01-01), Jang et al.
patent: 2005/0066898 (2005-03-01), Schmitt et al.
patent: 2005/0133160 (2005-06-01), Kennedy et al.
patent: 2005/0133161 (2005-06-01), Carpenter et al.
patent: 2005/0183827 (2005-08-01), White et al.
patent: 2005/0196254 (2005-09-01), Kim et al.
patent: 2005/0199182 (2005-09-01), Masuda et al.
patent: 2005/0223986 (2005-10-01), Choi et al.
patent: 2005/0251990 (2005-11-01), Choi et al.
patent: 2005/0255257 (2005-11-01), Choi et al.
patent: 2006/0005771 (2006-01-01), White et al.
patent: 2006/0005926 (2006-01-01), Kang
patent: 2006/0054280 (2006-03-01), Jang
patent: 2006/0060138 (2006-03-01), Keller et al.
patent: 2006/0130764 (2006-06-01), Quan
patent: 2006/0228496 (2006-10-01), Choi et al.
patent: 2006/0236934 (2006-10-01), Choi et al.
patent: 1501762 (2004-06-01), None
patent: 0843348 (1998-05-01), None
patent: 0985742 (2000-03-01), None
patent: 1118693 (2001-07-01), None
patent: 1167570 (2002-01-01), None
patent: 1168427 (2002-01-01), None
patent: 1286386 (2003-02-01), None
patent: 1321538 (2003-06-01), None
patent: 1386981 (2004-02-01), None
patent: 1693880 (2006-08-01), None
patent: 60-025235 (1985-02-01), None
patent: 01/004481 (1987-06-01), None
patent: 63-187619 (1988-08-01), None
patent: 01004481 (1989-0
Choi Soo Young
Park Beom Soo
Tiner Robin L.
White John M.
Applied Materials Inc.
Patterson & Sheridan L.L.P.
Zervigon Rudy
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