Plasma treatment at film layer to reduce sheet resistance...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified configuration

Reexamination Certificate

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Details

C257S288000, C257S622000, C257SE21400, C257SE21170, C257SE21311, C257SE21319

Reexamination Certificate

active

07378744

ABSTRACT:
A method of manufacturing a semiconductor device contact including forming an insulating layer over a substrate and forming an agglutinating layer over the insulating layer. The agglutinating layer is then exposed to a plasma treatment. A barrier layer is formed over the plasma-treated agglutinating layer, and a conductive layer is formed over the barrier layer.

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