Coating apparatus – Gas or vapor deposition – Work support
Patent
1994-02-14
1997-09-09
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
Work support
118723R, 118723E, 118723I, 118723MA, 156345, 31511121, 31511131, 31511151, 427488, 427535, 427569, 427571, C23C 1600, C23F 102, H05H 100
Patent
active
056651678
ABSTRACT:
A static chuck and a workpiece push-up pin are disposed on a susceptor which is one of opposed electrodes generating plasma. The push-up pin and the susceptor are electrically connected. A grounding circuit which discharges electric charges remaining on the susceptor is disposed in parallel with an RF power supply circuit which supplies RF power to the susceptor. Thus, electric charges remaining in the power supply circuit can be discharged and an abnormal discharging between the push-up pin and the susceptor can be prevented.
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Deguchi Yoichi
Ishikawa Kenji
Kawakami Satoru
Koyama Shiro
Breneman R. Bruce
Lund Jeffrie R.
Tokyo Electron Kabushiki Kaisha
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