Plasma treatment apparatus and control method thereof

Details Plasma treatment apparatus and control method thereof Plasma treatment apparatus and control method thereof

2007-07-17

2007-07-17

Tran, Thuy Vinh (Department: 2821)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

C427S585000, C156S345280, C156S345440, C315S111310

Reexamination Certificate

active

10498268

ABSTRACT:
A frequency control circuit (45) controls an oscillation frequency of a second high frequency power source51based on a phase difference between a voltage component and a current component measured by a phase difference sensor (41) and an input impedance to an impedance matching device (34) measured by an impedance sensor (42). An amplitude control circuit (44) controls a level of a high frequency electricity output by the second high frequency power source (51) based on an electricity (effective electricity) which is measured by a power sensor (40) and is to be supplied to the impedance matching device (34).

REFERENCES:
patent: 5478429 (1995-12-01), Komino et al.
patent: 5556549 (1996-09-01), Patrick et al.
patent: 6313583 (2001-11-01), Arita et al.
patent: 6685797 (2004-02-01), Matsumoto et al.
patent: 6887339 (2005-05-01), Goodman et al.
patent: 7096819 (2006-08-01), Chen et al.
patent: 2003/0127188 (2003-07-01), Matsumoto et al.
patent: 11-87097 (1999-03-01), None
patent: 2001-7089 (2001-01-01), None
patent: 451306 (2001-08-01), None
patent: 2001-250811 (2001-09-01), None
patent: 462092 (2001-11-01), None
patent: 462209 (2001-11-01), None

Affiliated with

Also associated with

Rating

Plasma treatment apparatus and control method thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma treatment apparatus and control method thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma treatment apparatus and control method thereof will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3735257