Plasma source employing spiral RF coil and method for using same

Details Plasma source employing spiral RF coil and method for using same Plasma source employing spiral RF coil and method for using same

1993-07-26

1995-07-25

Mis, David

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

315244, 315248, 315344, 31323131, 313238, 313325, H01J 100, H01J 3700

Patent

active

054365287

ABSTRACT:
A plasma source for generating a plasma in a chamber in conjunction with a radio frequency generator is described. The plasma source comprises a coil spiral, at least one insulator and at least one capacitor. The coil spiral conducts the radio frequency wave from the radio frequency generator and induces a plasma in the chamber. It comprises at least two segments. Each insulator and capacitor couple two adjacent segments of the coil spiral together.

REFERENCES:
patent: 3343022 (1967-09-01), Eckert
patent: 4156159 (1979-05-01), Takagi
patent: 4894591 (1990-01-01), Witting
patent: 5036252 (1991-07-01), Lob
patent: 5216329 (1993-06-01), Pelleteir
patent: 5226967 (1993-07-01), Chen et al.

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