Plasma source

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C315S111310, C315S111410, C118S7230AN, C118S7230IR

Reexamination Certificate

active

07342361

ABSTRACT:
A plasma source is described. The source includes a reactive impedance element formed from a plurality of electrodes. By providing such a plurality of electrodes and powering adjacent electrodes out of phase with one another, it is possible to improve the characteristics of the plasma generated.

REFERENCES:
patent: 5330615 (1994-07-01), Chu
patent: 5981899 (1999-11-01), Perrin et al.
patent: 6020686 (2000-02-01), Ye et al.
patent: 6183605 (2001-02-01), Schatz et al.
patent: 6375860 (2002-04-01), Ohkawa et al.
patent: 199 28 053 (2001-01-01), None
patent: 1 094 130 (2001-04-01), None
patent: 8 124864 (1996-05-01), None
patent: 2002 313744 (2002-10-01), None
patent: WO 95/32315 (1995-11-01), None
patent: WO 03/015123 (2003-02-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Plasma source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma source will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3979025

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.