Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1985-03-19
1988-11-01
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
525 61, 525506, 525480, 525100, 525102, 525103, 156643, G03C 500, C08F 800, C08L 8300
Patent
active
047820080
ABSTRACT:
Plasma-resistant polymeric materials are prepared by reacting a polymeric material containing reactive hydrogen functional groups with a multifunctional organometallic material containing at least two functional groups which are reactive with the reactive hydrogen functional groups of the polymeric material, such as hexamethylcyclotrisilazane.
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Babich Edward D.
Hatzakis Michael
Jacobs Scott L.
Parasczcak Juri R.
Shaw Jane M.
Hamilton Cynthia
International Business Machines - Corporation
Michl Paul R.
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