Plasma reactor sidewall shield

Details Plasma reactor sidewall shield Plasma reactor sidewall shield

1983-11-04

1985-04-23

Smith, John D.

Coating apparatus

Gas or vapor deposition

With treating means

118 501, 118728, 118725, 156345, 427 39, C23C 1308

Patent

active

045122830

ABSTRACT:
In a radial flow plasma reactor, where reagent gas is introduced into the reaction chamber of the plasma reactor via a gas distribution ring located on the perimeter of a heated substrate holder while diluent gas is introduced into the chamber via the holes in an annular diluent gas member disposed over an rf electrode, an upstanding peripheral shield is provided around the perimeter of the substrate holder, outboard of the reagent gas introduction ports of the gas distribution ring.

REFERENCES:
patent: Re30244 (1980-04-01), Alexander, Jr. et al.
patent: 4173661 (1979-11-01), Bourdon

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