Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate
2006-05-09
2006-05-09
Lee, Wilson (Department: 2821)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
C422S168000
Reexamination Certificate
active
07042159
ABSTRACT:
In the plasma reactor of the present invention, streamer discharge is caused in a wide region so as to increase a plasma generation region without complicating the architecture of the plasma reactor and increasing the cost. In the plasma reactor of the invention, a needle-shaped first electrode and a plate-shaped second electrode are disposed to oppose and to be perpendicular to each other, and the first electrode has a pointed portion as the end thereof on the side of the second electrode and the pointed portion has a point angle θ not less than 30 degrees and not more than 90 degrees, and preferably not less than 60 degrees and not more than 90 degrees.
REFERENCES:
patent: 4954320 (1990-09-01), Birmingham et al.
patent: 5801489 (1998-09-01), Chism et al.
patent: 6455014 (2002-09-01), Hammerstrom et al.
patent: 6811757 (2004-11-01), Niv et al.
patent: 6818193 (2004-11-01), Christodoulatos et al.
patent: 2001/0043890 (2001-11-01), Son
patent: 2004/0050684 (2004-03-01), Babko-Malyi et al.
patent: 8-155249 (1996-06-01), None
patent: 08-155249 (1996-06-01), None
patent: 9-869 (1997-01-01), None
patent: 09-000869 (1997-01-01), None
patent: 2003-38932 (2003-02-01), None
Kagawa Kenkichi
Motegi Kanji
Ohkubo Toshikazu
Tanaka Toshio
Al-Nazer Leith A.
Daikin Industries Ltd.
Lee Wilson
Shinjyu Global IP Counselors
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