Plasma reactor and purification equipment

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C422S168000

Reexamination Certificate

active

07042159

ABSTRACT:
In the plasma reactor of the present invention, streamer discharge is caused in a wide region so as to increase a plasma generation region without complicating the architecture of the plasma reactor and increasing the cost. In the plasma reactor of the invention, a needle-shaped first electrode and a plate-shaped second electrode are disposed to oppose and to be perpendicular to each other, and the first electrode has a pointed portion as the end thereof on the side of the second electrode and the pointed portion has a point angle θ not less than 30 degrees and not more than 90 degrees, and preferably not less than 60 degrees and not more than 90 degrees.

REFERENCES:
patent: 4954320 (1990-09-01), Birmingham et al.
patent: 5801489 (1998-09-01), Chism et al.
patent: 6455014 (2002-09-01), Hammerstrom et al.
patent: 6811757 (2004-11-01), Niv et al.
patent: 6818193 (2004-11-01), Christodoulatos et al.
patent: 2001/0043890 (2001-11-01), Son
patent: 2004/0050684 (2004-03-01), Babko-Malyi et al.
patent: 8-155249 (1996-06-01), None
patent: 08-155249 (1996-06-01), None
patent: 9-869 (1997-01-01), None
patent: 09-000869 (1997-01-01), None
patent: 2003-38932 (2003-02-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Plasma reactor and purification equipment does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma reactor and purification equipment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma reactor and purification equipment will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3644133

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.