Plasma reactive ion etching of aluminum and aluminum alloys

Details Plasma reactive ion etching of aluminum and aluminum alloys Plasma reactive ion etching of aluminum and aluminum alloys

1983-09-26

1985-03-19

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156656, 1566591, 156665, 204192E, 252 791, C23F 102, C03C 1500, C03C 2506, B44C 122

Patent

active

045057826

ABSTRACT:
A process for a selective plasma-based reactive ion etching of aluminum and aluminum alloys with silicon and copper, employing gas mixtures having BCl.sub.3 as a major constituent and Cl.sub.2, SiF.sub.4, and O.sub.2 as the minor constituents. The major constituent should constitute 40% to 65% by volume of the mixture.

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