Plasma product treatment apparatus and methods and gas transport

Details Plasma product treatment apparatus and methods and gas transport Plasma product treatment apparatus and methods and gas transport

1987-01-20

1988-10-11

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156345, 20419232, 204298, B44C 122, C03C 1500, C03C 2506

Patent

active

047769238

ABSTRACT:
In semiconductor treatment apparatus with a plasma generating zone, a treatment zone, and a bent path connecting the two so as to block direct transmission of ultraviolet light from the plasma generating zone to the workpiece in the treatment zone, a light trap is provided to suppress indirect transmission of light as by reflection or by transmission within transparent walls of a conduit defining the bent path.

REFERENCES:
patent: 3837856 (1974-09-01), Irving et al.
patent: 3879597 (1975-04-01), Bersin et al.
patent: 4065369 (1977-12-01), Ogawa et al.
patent: 4123663 (1978-10-01), Horiike
patent: 4160690 (1979-07-01), Shibagaki et al.
patent: 4192706 (1980-03-01), Horiike
patent: 4304983 (1981-12-01), Pierfederici
patent: 4615756 (1986-10-01), Tsujii et al.
patent: 4673456 (1987-06-01), Spencer et al.
Science Magazine, vol. 230, dated Oct. 25, 1985, p. 396.

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