Plasma processor

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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Details

156345, 156646, 156662, 204164, 204192E, 204298, 250531, B01K 100

Patent

active

041233166

ABSTRACT:
A plasma processor comprising a plasma generating chamber which has a plasma outflow port, an evacuated plasma processing chamber which receives therein a member to be processed, such as a semiconductor substrate, and coaxial magnet means to form coaxial magnetic fields for transporting plasma from the plasma outflow port of the plasma generating chamber to the member to be processed, the distance between the plasma outflow port and the member to be processed being made shorter than the mean free path of gas remaining in the plasma processing chamber.

REFERENCES:
patent: 3291715 (1966-12-01), Anderson
patent: 3528387 (1970-09-01), Hamilton
patent: 3708418 (1973-01-01), Quinn
patent: 3824398 (1974-07-01), Boom

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