Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1988-03-25
1990-08-07
LaRoche, Eugene R.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
20429816, 20429818, 118 501, H05H 118, H05H 130, H01L 21306
Patent
active
049470850
ABSTRACT:
A plasma processor wherein a substrate is processed using a plasma in a reaction gas generated through electron cyclotron resonance includes a magnetostatic field generator for generating a magnetostatic field, an electric field generator for generating an r.f. electric field perpendicular to the magnetostatic field, and a moving magnetic field generator for generating a moving magnetic field which intersects the magnetostatic field between the magnetostatic field generator and the substrate.
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Idehara et al., "Generation of a Highly Magnetized Plasma by Using the Superconducting Coil", J. Appl. Phys., vol. 52, No. 5, May 1981, pp. 3276-3278.
Hanazaki Minoru
Minami Toshihiko
Nakanishi Koichiro
Ootera Hiroki
Ham Seung
LaRoche Eugene R.
Mitsubishi Denki & Kabushiki Kaisha
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