Plasma processing system and method of contolling the same

Details Plasma processing system and method of contolling the same Plasma processing system and method of contolling the same

2011-01-04

2011-01-04

Alejandro, Luz L. (Department: 1716)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With measuring, sensing, detection or process control means

C118S712000, C118S7230AN

Reexamination Certificate

active

07862681

ABSTRACT:
Provided is a plasma processing system comprising: a plasma reactor generating plasma by receiving an input gas; and a radio frequency generator supplying radio frequency. The radio frequency generator supplies radio frequency power for plasma generation to the plasma reactor, wherein upon power interruption within a predetermined time occurring during the operation of the plasma reactor, the radio frequency generator re-supplies the radio frequency power, without discontinuing the operation of the plasma reactor, after power returns. Thereby, the plasma reactor stably maintains plasma upon momentary power interruption.

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