Plasma processing method for forming a silicon nitride film...

Details Plasma processing method for forming a silicon nitride film... Plasma processing method for forming a silicon nitride film...

2007-04-17

2009-12-08

Chen, Bret (Department: 1792)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

C427S579000, C427S255270

Reexamination Certificate

active

07629033

ABSTRACT:
A plasma processing method for forming a silicon nitride film on a silicon oxide film, the method including preparing a substrate on which the silicon oxide film is formed; generating plasma by supplying a nitrogen gas onto the silicon oxide film; and nitride-processing the silicon oxide film by the plasma so as to modify an upper portion of the silicon oxide film into the silicon nitride film.

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