Plasma processing method and plasma generating device

Details Plasma processing method and plasma generating device Plasma processing method and plasma generating device

1991-10-21

1993-03-30

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31323131, 250426, H05H 124

Patent

active

051987244

ABSTRACT:
A plasma generating device includes a central conductor, a peripheral cylindrical conductor surrounding the central conductor, an insulating cylinder interposed between the central conductor and the peripheral conductor in order to prevent direct arc discharge from occurring between the central conductor and the peripheral conductor. The central and peripheral conductors and the insulating cylinder are coaxially arranged in order to define a cylindrical discharging space therein. By applying a high frequency energy to the central conductor, glow discharge is caused between the central and peripheral conductors. A reactive gas is introduced from one end of the discharging space, excited by the glow discharge and goes out from the other end as an excited plasma to a working place where a work piece is processed by the plasma.

REFERENCES:
patent: 3579027 (1971-05-01), Pater
patent: 4596030 (1986-06-01), Herziger et al.
patent: 4602376 (1986-07-01), Doucet et al.
patent: 4912731 (1990-03-01), Nardi
patent: 4987345 (1991-01-01), Stormberg et al.

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