Plasma processing method

Details Plasma processing method Plasma processing method

1997-04-25

1998-06-16

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427131, 427249, 427261, 427402, 427585, H05H 124

Patent

active

057666962

ABSTRACT:
In a plasma processing apparatus including a cylindrical electrode and plural electrodes which are disposed to face the cylindrical electrode in a circumferential direction of the cylindrical electrode, the plural electrodes are designed to have the prescribed curvature corresponding to that of the surface of the cylindrical electrode. The interval between the cylindrical electrode and the plural electrodes may be fixed or stepwise varied in the circumferential direction. The area of each of the plural electrodes may be different from that of the other electrodes.

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