Plasma processing method

Details Plasma processing method Plasma processing method

1991-01-23

1993-05-25

Hearn, Brian E.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156345, 118723, 427571, H01L 2100

Patent

active

052136582

ABSTRACT:
In a plasma processing method and a plasma processing apparatus, plasma is processed by floating a focus ring by the repulsion between a magnet mounted in the focus ring and another electromagnet and adjusting the height of the focus ring to an optimal height by the current flowing to the electromagnet. Therefore, it is possible to set an optimal height of the focus ring for each layer in the laminated film etching, to enhance the uniformity of the laminated film etching, and to achieve a precise etching.

REFERENCES:
patent: 4350578 (1982-09-01), Frieser et al.
patent: 4351805 (1982-09-01), Reisman et al.
patent: 4793975 (1988-12-01), Drage

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